Title :
New progressive method suitable for the exposure optimization of large and complex defect-free chips direct written by ZBA 21 e-beam tool
Author :
Matay, Ladislav ; Andok, Robert ; Barak, Vladislav ; Konecnikova, Anna ; Kostic, Ivan ; Partel, Stefan ; Hudek, Peter
Author_Institution :
Inst. of Inf., Bratislava
Abstract :
The use of a new progressive method suitable for the exposure optimization is investigated for large and complex defect-free chips direct written by ZBA 21 electron beam pattern generator together with all corresponding microprocesses. Well controlled and resolved details (spaces) between individual quasi-square structures of the final large area neural holography chip were achieved in the range of about 50 nm.
Keywords :
electron beam lithography; nanolithography; neural chips; optimisation; ZBA 21 e-beam tool; complex defect-free chips; direct-write electron-beam lithography; electron beam pattern generator; exposure optimization; microprocesses; neural holography chip; quasi-square structures; Electron beams; Holography; Informatics; Lithography; Microstructure; Optimization methods; Proximity effect; Semiconductor devices; Synthetic aperture sonar; Variable speed drives;
Conference_Titel :
Advanced Semiconductor Devices and Microsystems, 2008. ASDAM 2008. International Conference on
Conference_Location :
Smolenice
Print_ISBN :
978-1-4244-2325-5
Electronic_ISBN :
978-1-4244-2326-2
DOI :
10.1109/ASDAM.2008.4743316
