DocumentCode :
2297468
Title :
Simulation of Influence of AlGaN/GaN Heterojunction Parameters on Its Capacitance Curves
Author :
Osvald, J.
Author_Institution :
Inst. of Electr. Eng., Slovak Acad. of Sci., Bratislava
fYear :
2008
fDate :
12-16 Oct. 2008
Firstpage :
319
Lastpage :
322
Abstract :
We used the solution of the Poisson equation together with the drift and diffusion equations to simulate precisely the voltage dependence of the AlGaN/GaN capacitor structure. We demonstrate the influence of the structure parameters like doping concentrations of AlGaN, Schottky barrier height, and the thickness of the AlGaN layer on resulting C-V curve of the heterojunction capacitor. Also the capacitance of the structure in forward bias was simulated and the capacitance peak that sometimes occurs in the measurements was identified.
Keywords :
III-V semiconductors; Poisson equation; Schottky barriers; aluminium compounds; capacitance; gallium compounds; wide band gap semiconductors; AlGaN-GaN; Poisson equation; Schottky barrier height; capacitance curves; diffusion equations; drift equations; heterojunction parameters; voltage dependence; Aluminum gallium nitride; Capacitance; Capacitance-voltage characteristics; Capacitors; Doping; Gallium nitride; Heterojunctions; Poisson equations; Schottky barriers; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Semiconductor Devices and Microsystems, 2008. ASDAM 2008. International Conference on
Conference_Location :
Smolenice
Print_ISBN :
978-1-4244-2325-5
Electronic_ISBN :
978-1-4244-2326-2
Type :
conf
DOI :
10.1109/ASDAM.2008.4743348
Filename :
4743348
Link To Document :
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