Title :
A modified electroosmotic micromixer for highly miniaturized microchannels
Author :
Vafaie, Reza Hadjiaghaie ; Mehdipoor, Mahnaz ; Pourmand, Adel ; Poorreza, Elnaz ; Ghavifekr, Habib Badri
Author_Institution :
Fac. of Electr. Eng., Sahand Univ. of Technol., Tabriz, Iran
Abstract :
Miniaturization of microchannels leads to low Reynolds number flow. In such a case, electroosmotic force is the best choice to perturb fluid. Due to low Reynolds number, mixing process is one of the major problems in the Lab-On-a-Chip (LOC) or micro Total Analysis Systems (μ-TAS). This paper proposes a novel technique of microchannel fabrication based on surface micromachining, the technology process needs to cover the exciting electrodes by an insulator layer. A more miniaturized electroosmotically actuated micromixer is designed using a novel sinusoidal-shaped electrode patterns to induce chaotic regime. During the fabrication process a sinusoidal-shaped electrode patterns are covered by a thin silicon nitride layer as an insulator layer. Result reveals that the micromixer is able to perturb the low Reynolds number flow, as well as the silicon nitride layer can reduce the high voltage gradient at the sharp corners and edges of the electrodes. The influence of excitation and geometrical parameters on mixing quality is investigated.
Keywords :
chaos; electrohydrodynamics; electrophoresis; lab-on-a-chip; microchannel flow; micromachining; mixing; osmosis; silicon compounds; Si3N4; chaotic regime; electroosmotic force; excitation parameters; fabrication process; fluid perturbation analysis; geometrical parameters; high miniaturized microchannels; high voltage gradient; insulator layer; lab-on-a-chip; low Reynolds number flow; microchannel fabrication; microchannel miniaturization analysis; micrototal analysis systems; miniaturized electroosmotically actuated micromixer; mixing process; mixing quality; modified electroosmotic micromixer; sinusoidal-shaped electrode patterns; surface micromachining; thin silicon nitride layer; Electric fields; Electrodes; Fabrication; Fluids; Insulators; Microchannel; Silicon; Chaotic regime; Electroosmotic flow; Insulating layer; Lab on a chip; Low Reynolds number flow; MEMS-based; Micromixer; Surface micromaching;
Conference_Titel :
Mechatronics and its Applications (ISMA), 2012 8th International Symposium on
Conference_Location :
Sharjah
Print_ISBN :
978-1-4673-0860-1
DOI :
10.1109/ISMA.2012.6215179