DocumentCode
2300867
Title
Chemically-etched ultra-high-Q micro-cavities on a silicon chip
Author
Chen, Tong ; Lee, Hansuek ; Li, Jiang ; Vahala, Kerry
Author_Institution
Thomas J. Watson, Sr., Lab. of Appl. Phys., California Inst. of Technol., Pasadena, CA, USA
fYear
2012
fDate
23-27 Sept. 2012
Firstpage
262
Lastpage
263
Abstract
Optical resonators with quality factor as high as 875 million are demonstrated. These silicon-chip-based devices are fabricated using only lithography and chemical etching, thereby expanding integration opportunities and possible applications.
Keywords
Q-factor; elemental semiconductors; etching; integrated optics; micro-optomechanical devices; microcavities; microcavity lasers; microfabrication; micromechanical resonators; optical fabrication; photolithography; silicon; Si; chemically-etched ultrahigh-Q microcavities; lithography; optical resonators; quality factor; silicon chip; silicon-chip-based device; Microcavities; Nonlinear optics; Optical pumping; Optical sensors; Q factor; Scattering; optical resonators; silicon-chip-based devices;
fLanguage
English
Publisher
ieee
Conference_Titel
Photonics Conference (IPC), 2012 IEEE
Conference_Location
Burlingame, CA
Print_ISBN
978-1-4577-0731-5
Type
conf
DOI
10.1109/IPCon.2012.6358592
Filename
6358592
Link To Document