• DocumentCode
    2303602
  • Title

    Downstream characterization of 20-cm diameter 915MHz/2.45 GHz multipolar electron-cyclotron-resonant plasma source

  • Author

    Sze, F.C. ; Hopwood, Jeffrey ; Asmussen, J.

  • Author_Institution
    Michigan State University
  • fYear
    1991
  • fDate
    3-5 June 1991
  • Firstpage
    121
  • Lastpage
    121
  • Keywords
    Etching; Inductors; Magnetic confinement; Magnetic resonance; Plasma applications; Plasma confinement; Plasma density; Plasma materials processing; Plasma measurements; Plasma sources;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1991. IEEE Conference Record - Abstracts., 1991 IEEE International Conference on
  • Conference_Location
    Williamsburg, VA, USA
  • Print_ISBN
    0-7803-0147-1
  • Type

    conf

  • DOI
    10.1109/PLASMA.1991.695544
  • Filename
    695544
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2303602