DocumentCode :
2303602
Title :
Downstream characterization of 20-cm diameter 915MHz/2.45 GHz multipolar electron-cyclotron-resonant plasma source
Author :
Sze, F.C. ; Hopwood, Jeffrey ; Asmussen, J.
Author_Institution :
Michigan State University
fYear :
1991
fDate :
3-5 June 1991
Firstpage :
121
Lastpage :
121
Keywords :
Etching; Inductors; Magnetic confinement; Magnetic resonance; Plasma applications; Plasma confinement; Plasma density; Plasma materials processing; Plasma measurements; Plasma sources;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1991. IEEE Conference Record - Abstracts., 1991 IEEE International Conference on
Conference_Location :
Williamsburg, VA, USA
Print_ISBN :
0-7803-0147-1
Type :
conf
DOI :
10.1109/PLASMA.1991.695544
Filename :
695544
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2303602
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