DocumentCode
2304125
Title
An Automated and Fast OPC Algorithm for OPC-Aware Layout Design
Author
Chen, Ye ; Shi, Zheng ; Yan, Xiaolang
Author_Institution
Inst. of VLSI Design, Zhejiang Univ., Hangzhou
fYear
2007
fDate
26-28 March 2007
Firstpage
782
Lastpage
787
Abstract
To reduce design spin time, OPC-unfriendly spots in IC layout should be found out by designer before tape-out. This can be done by firstly running a "trial OPC" step on the layout, followed by running an OPC step to verify the result. In this paper we introduce a new OPC algorithm using an edge bias modeling method. When given a piece of sample post-OPC layout, software based on this algorithm can automatically correct a design with similar recipe but dozens of times faster than traditional model-based method, at cost of some accuracy loss. This makes the algorithm a good choice for "trial OPC"
Keywords
integrated circuit layout; integrated circuit modelling; proximity effect (lithography); OPC algorithm; OPC-aware layout design; edge bias modeling method; post-OPC layout; trial OPC; Algorithm design and analysis; Bridges; Costs; Integrated circuit layout; Lighting; Manufacturing; Optical distortion; Optical losses; Software algorithms; Very large scale integration;
fLanguage
English
Publisher
ieee
Conference_Titel
Quality Electronic Design, 2007. ISQED '07. 8th International Symposium on
Conference_Location
San Jose, CA
Print_ISBN
0-7695-2795-7
Type
conf
DOI
10.1109/ISQED.2007.32
Filename
4149129
Link To Document