• DocumentCode
    2304125
  • Title

    An Automated and Fast OPC Algorithm for OPC-Aware Layout Design

  • Author

    Chen, Ye ; Shi, Zheng ; Yan, Xiaolang

  • Author_Institution
    Inst. of VLSI Design, Zhejiang Univ., Hangzhou
  • fYear
    2007
  • fDate
    26-28 March 2007
  • Firstpage
    782
  • Lastpage
    787
  • Abstract
    To reduce design spin time, OPC-unfriendly spots in IC layout should be found out by designer before tape-out. This can be done by firstly running a "trial OPC" step on the layout, followed by running an OPC step to verify the result. In this paper we introduce a new OPC algorithm using an edge bias modeling method. When given a piece of sample post-OPC layout, software based on this algorithm can automatically correct a design with similar recipe but dozens of times faster than traditional model-based method, at cost of some accuracy loss. This makes the algorithm a good choice for "trial OPC"
  • Keywords
    integrated circuit layout; integrated circuit modelling; proximity effect (lithography); OPC algorithm; OPC-aware layout design; edge bias modeling method; post-OPC layout; trial OPC; Algorithm design and analysis; Bridges; Costs; Integrated circuit layout; Lighting; Manufacturing; Optical distortion; Optical losses; Software algorithms; Very large scale integration;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Quality Electronic Design, 2007. ISQED '07. 8th International Symposium on
  • Conference_Location
    San Jose, CA
  • Print_ISBN
    0-7695-2795-7
  • Type

    conf

  • DOI
    10.1109/ISQED.2007.32
  • Filename
    4149129