Title :
Modeling remote plasma enhanced CVD of Si/sub 2/N/sub 4/ using Rg/SiH/sub 4//NH/sub 3/ chemistries
Author :
Kushner, Mark J. ; YiIin Weng ; Sommerer, T.J.
Author_Institution :
University of Illinois
Keywords :
Chemical vapor deposition; Electrons; Gases; Hydrogen; Inductors; Plasma chemistry; Plasma materials processing; Plasma simulation; Plasma temperature; Roentgenium;
Conference_Titel :
Plasma Science, 1991. IEEE Conference Record - Abstracts., 1991 IEEE International Conference on
Conference_Location :
Williamsburg, VA, USA
Print_ISBN :
0-7803-0147-1
DOI :
10.1109/PLASMA.1991.695549