• DocumentCode
    2304730
  • Title

    Layer by layer growth of Bi2Te3 epitaxial thermoelectric heterostructures

  • Author

    Boikov, Yu.A. ; Danilov, V.A. ; Claeson, T. ; Erts, D.

  • fYear
    1997
  • fDate
    26-29 Aug 1997
  • Firstpage
    89
  • Lastpage
    92
  • Abstract
    Epitaxial films of n- and p-type (0001)Bi2Te3 with carrier concentrations between 1×1018 and 8×1019 cm-3 have been grown by hot wall epitaxy at the surface of mica. Granular textured films have been grown on barium fluoride substrates. A regular system of growth steps of 1 nm height was observed at the surface of the Bi2 Te3 films grown on mica at 600 K. The spirals (m≈10 6 cm-2) were detected by AFM at the surface of the thermoelectric films when substrate temperature was increased to 640 K. Steps at the surface of freshly cleaved BaF2 substrate promote the formation of a grains in the Bi2Te3 film and rough surface. The α 2σ for the Bi2 Te3 films with electron and hole conductance at 300 K was in the range 40-60 μW cm-1 K-2
  • Keywords
    atomic force microscopy; bismuth compounds; carrier density; semiconductor epitaxial layers; semiconductor growth; semiconductor materials; surface topography; thermoelectricity; vapour phase epitaxial growth; 600 K; 640 K; AFM; BaF2; Bi2Te3; barium fluoride substrates; carrier concentration; epitaxial thermoelectric heterostructures; granular textured films; growth spirals; growth steps; hot wall epitaxy; mica surface; Barium; Bismuth; Epitaxial growth; Rough surfaces; Spirals; Substrates; Surface roughness; Tellurium; Temperature; Thermoelectricity;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Thermoelectrics, 1997. Proceedings ICT '97. XVI International Conference on
  • Conference_Location
    Dresden
  • ISSN
    1094-2734
  • Print_ISBN
    0-7803-4057-4
  • Type

    conf

  • DOI
    10.1109/ICT.1997.666981
  • Filename
    666981