DocumentCode
2304730
Title
Layer by layer growth of Bi2Te3 epitaxial thermoelectric heterostructures
Author
Boikov, Yu.A. ; Danilov, V.A. ; Claeson, T. ; Erts, D.
fYear
1997
fDate
26-29 Aug 1997
Firstpage
89
Lastpage
92
Abstract
Epitaxial films of n- and p-type (0001)Bi2Te3 with carrier concentrations between 1×1018 and 8×1019 cm-3 have been grown by hot wall epitaxy at the surface of mica. Granular textured films have been grown on barium fluoride substrates. A regular system of growth steps of 1 nm height was observed at the surface of the Bi2 Te3 films grown on mica at 600 K. The spirals (m≈10 6 cm-2) were detected by AFM at the surface of the thermoelectric films when substrate temperature was increased to 640 K. Steps at the surface of freshly cleaved BaF2 substrate promote the formation of a grains in the Bi2Te3 film and rough surface. The α 2σ for the Bi2 Te3 films with electron and hole conductance at 300 K was in the range 40-60 μW cm-1 K-2
Keywords
atomic force microscopy; bismuth compounds; carrier density; semiconductor epitaxial layers; semiconductor growth; semiconductor materials; surface topography; thermoelectricity; vapour phase epitaxial growth; 600 K; 640 K; AFM; BaF2; Bi2Te3; barium fluoride substrates; carrier concentration; epitaxial thermoelectric heterostructures; granular textured films; growth spirals; growth steps; hot wall epitaxy; mica surface; Barium; Bismuth; Epitaxial growth; Rough surfaces; Spirals; Substrates; Surface roughness; Tellurium; Temperature; Thermoelectricity;
fLanguage
English
Publisher
ieee
Conference_Titel
Thermoelectrics, 1997. Proceedings ICT '97. XVI International Conference on
Conference_Location
Dresden
ISSN
1094-2734
Print_ISBN
0-7803-4057-4
Type
conf
DOI
10.1109/ICT.1997.666981
Filename
666981
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