• DocumentCode
    230571
  • Title

    CVD nanodiamond thin films as high yield photocathodes driven by UV laser pulses

  • Author

    Mazellier, Jean-Paul ; Di Giola, Cyril ; Legagneux, Pierre ; Hebert, C. ; Scorsonne, Emmanuel ; Bergonzo, P.

  • Author_Institution
    Lab. de Micro et Nano Phys., Thales Res. & Technol., Palaiseau, France
  • fYear
    2014
  • fDate
    6-10 July 2014
  • Firstpage
    14
  • Lastpage
    15
  • Abstract
    We present here an UV (266nm) photoemission setup dedicated to measure properties of conductive materials under DC extraction field as photocathodes. We have successfully tested copper, as reference material, and silicon samples. It allowed us testing photoemission properties of thin CVD nanodiamond films on silicon substrates. We demonstrate a strong influence on silicon doping type on the photoemission yield, pointing out a clear influence of the nanodiamond-silicon interface in the photoemission process. Furthermore, the nanodiamond-silicon structure exhibit one order of magnitude higher photoemission current compared to copper test samples.
  • Keywords
    chemical vapour deposition; copper; diamond; doping; elemental semiconductors; photocathodes; photoemission; semiconductor thin films; silicon; ultraviolet spectra; C-Si; CVD nanodiamond thin films; Cu; DC extraction field; Si; UV laser pulses; UV photoemission setup; conductive materials; copper; high yield photocathodes; nanodiamond-silicon interface; nanodiamond-silicon structure; photoemission current; photoemission yield; reference material; silicon doping; silicon substrates; wavelength 266 nm; Cathodes; Silicon; electron beam; nanodiamond; photoemission;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Nanoelectronics Conference (IVNC), 2014 27th International
  • Conference_Location
    Engelberg
  • Print_ISBN
    978-1-4799-5306-6
  • Type

    conf

  • DOI
    10.1109/IVNC.2014.6894736
  • Filename
    6894736