DocumentCode
230571
Title
CVD nanodiamond thin films as high yield photocathodes driven by UV laser pulses
Author
Mazellier, Jean-Paul ; Di Giola, Cyril ; Legagneux, Pierre ; Hebert, C. ; Scorsonne, Emmanuel ; Bergonzo, P.
Author_Institution
Lab. de Micro et Nano Phys., Thales Res. & Technol., Palaiseau, France
fYear
2014
fDate
6-10 July 2014
Firstpage
14
Lastpage
15
Abstract
We present here an UV (266nm) photoemission setup dedicated to measure properties of conductive materials under DC extraction field as photocathodes. We have successfully tested copper, as reference material, and silicon samples. It allowed us testing photoemission properties of thin CVD nanodiamond films on silicon substrates. We demonstrate a strong influence on silicon doping type on the photoemission yield, pointing out a clear influence of the nanodiamond-silicon interface in the photoemission process. Furthermore, the nanodiamond-silicon structure exhibit one order of magnitude higher photoemission current compared to copper test samples.
Keywords
chemical vapour deposition; copper; diamond; doping; elemental semiconductors; photocathodes; photoemission; semiconductor thin films; silicon; ultraviolet spectra; C-Si; CVD nanodiamond thin films; Cu; DC extraction field; Si; UV laser pulses; UV photoemission setup; conductive materials; copper; high yield photocathodes; nanodiamond-silicon interface; nanodiamond-silicon structure; photoemission current; photoemission yield; reference material; silicon doping; silicon substrates; wavelength 266 nm; Cathodes; Silicon; electron beam; nanodiamond; photoemission;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Nanoelectronics Conference (IVNC), 2014 27th International
Conference_Location
Engelberg
Print_ISBN
978-1-4799-5306-6
Type
conf
DOI
10.1109/IVNC.2014.6894736
Filename
6894736
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