DocumentCode :
2306302
Title :
Understanding defects in type-II superlattice IR photodiodes
Author :
Jackson, E.M. ; Maximenko, S. ; Nolde, J.A. ; Stine, R.R. ; Canedy, C.L. ; Vurgaftman, I. ; Affouda, C.A. ; Gonzalez, M. ; Aifer, E.H. ; Meyer, J.R.
Author_Institution :
Naval Res. Lab., Washington, DC, USA
fYear :
2010
fDate :
7-11 Nov. 2010
Firstpage :
636
Lastpage :
636
Abstract :
This paper studies T2SL material properties using chemical and structural probes with atomic scale resolution, and transport tools that are particularly sensitive to SRH centers, defect scattering, and surface leakage. Electron beam induced current (EBIC) mapping is being used to identify individual localized recombination centers, which are then probed compositionally with energy dispersive x-ray spectroscopy (EDS). Focused ion beam milling (FIB) is used to extract regions of high recombination that neighbor inactive regions for high resolution transmission electron microscopy, to fully reveal and compare their underlying structure.
Keywords :
EBIC; X-ray chemical analysis; focused ion beam technology; infrared detectors; photodiodes; semiconductor superlattices; transmission electron microscopy; Shockley Hall Read centers; T2SL material properties; atomic scale resolution; defect scattering; electron beam induced current mapping; energy dispersive X-ray spectroscopy; focused ion beam milling; high resolution transmission electron microscopy; localized recombination centers; structural probes; surface leakage; type-II superlattice IR photodiodes;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
IEEE Photonics Society, 2010 23rd Annual Meeting of the
Conference_Location :
Denver, CO
ISSN :
-
Print_ISBN :
978-1-4244-5368-9
Electronic_ISBN :
-
Type :
conf
DOI :
10.1109/PHOTONICS.2010.5699048
Filename :
5699048
Link To Document :
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