• DocumentCode
    230691
  • Title

    Photo-cathode analysis for SwissFEL

  • Author

    Schaer, M. ; Craievich, Paolo ; Stingelin, L.

  • Author_Institution
    Paul Scherrer Inst., Villigen, Switzerland
  • fYear
    2014
  • fDate
    6-10 July 2014
  • Firstpage
    174
  • Lastpage
    175
  • Abstract
    The SwissFEL facility is currently being built at Paul Scherrer Institut (PSI) and aims at the generation of sub-nanometer X-rays within a pulse duration in the order of 10 fs, by sending a high energy electron beam through undulators [1]. A key parameter to achieve this goal is the transverse brightness B⊥ ∝ / I/εr2 of the electron beam at the exit of the injector. A high peak current I and a low transverse emittance εr are required in order for the lasing process to work efficiently.
  • Keywords
    electron beams; free electron lasers; wigglers; Paul Scherrer Institut; SwissFEL facility; high energy electron beam; lasing process; photo-cathode analysis; pulse duration; sub-nanometer X-rays; transverse emittance; undulators; Cathodes; Copper; Laser beams; Lasers; Radio frequency; Solenoids; Standards;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Nanoelectronics Conference (IVNC), 2014 27th International
  • Conference_Location
    Engelberg
  • Print_ISBN
    978-1-4799-5306-6
  • Type

    conf

  • DOI
    10.1109/IVNC.2014.6894797
  • Filename
    6894797
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=230691