• DocumentCode
    230698
  • Title

    Growth and field emission performance of micro-patterned boron nanowire arrays

  • Author

    Haibo Gan ; Fei Liu ; Shunyu Jin ; Tongyi Guo ; Shaozhi Deng ; Ningsheng Xu

  • Author_Institution
    GuangDong Province Key Lab. of Display Mater. & Technol., Sun Yat-sen Univ., Guangzhou, China
  • fYear
    2014
  • fDate
    6-10 July 2014
  • Firstpage
    180
  • Lastpage
    181
  • Abstract
    Boron nanowire micro-patterns are prepared by CVD method. Ni film is chosen to be the catalyst for fabrication of boron nanowires. Patterned boron nanowires are found to have relatively lower turn-on field and good emission uniformity, which should have a promising future in FED area.
  • Keywords
    boron; catalysts; chemical vapour deposition; field emission; nanofabrication; nanowires; B; FED area; catalyst; field emission properties; micropatterned boron nanowire arrays; nickel films; Gallium nitride; boron nanowires; field emission; patterned growth; uniformity;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Nanoelectronics Conference (IVNC), 2014 27th International
  • Conference_Location
    Engelberg
  • Print_ISBN
    978-1-4799-5306-6
  • Type

    conf

  • DOI
    10.1109/IVNC.2014.6894800
  • Filename
    6894800
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=230698