DocumentCode :
2307808
Title :
Contact resistance degradation in z-axis connectors operated at burn-in temperatures
Author :
Guarin, Femando J. ; Longenbach, Kort F.
Author_Institution :
IBM Technol. Products, East Fishkill, NY, USA
fYear :
1993
fDate :
1-4 Jun 1993
Firstpage :
88
Lastpage :
92
Abstract :
Elevated temperature tests were performed on molybdenum wire button z-axis socket assemblies in an effort to develop and qualify a high footprint density burn-in socket for pinless modules. Stress tests were performed at 200°C, with periodic mating and unmating of the substrate from the socket. These tests revealed that after 172 hours of stress, the mean contact resistance increased by over an order of magnitude. Individual measurements of the stressed circuit board, socket and substrate revealed that the substrate contributed the majority of the observed resistance increase and that the degradation was due to diffusion and oxidation of the Cr/Cu/Ni/Au pad metallurgy on the pinless ceramic substrates. The resistance contributions of the socket and circuit board pads were also analyzed and various wire button contact metallurgies were evaluated in order to minimize their role in the degradation. Overall, this work demonstrates the importance of maintaining the integrity of all metallurgical interfaces when using z-axis interconnects at elevated temperatures
Keywords :
contact resistance; electric connectors; molybdenum; oxidation; reliability; stress analysis; surface diffusion; 172 hr; 200 C; Cr-Cu-Ni-Au; Cr/Cu/Ni/Au pad metallurgy; Mo; Mo wire button z-axis socket assemblies; burn-in temperatures; circuit board pads; contact resistance degradation; diffusion; elevated temperature tests; metallurgical interfaces; oxidation; pinless ceramic substrates; pinless modules; stress tests; z-axis connectors; Circuit testing; Connectors; Contact resistance; Degradation; Performance evaluation; Printed circuits; Sockets; Stress; Temperature; Wire;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronic Components and Technology Conference, 1993. Proceedings., 43rd
Conference_Location :
Orlando, FL
Print_ISBN :
0-7803-0794-1
Type :
conf
DOI :
10.1109/ECTC.1993.346849
Filename :
346849
Link To Document :
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