Title :
Ultra-low stress coating process: an enabling technology for extreme performance thin film interference filters
Author :
Ockenfuss, Georg J. ; O´Brien, N.A. ; Williams, Edward
Author_Institution :
JDS Uniphase, Santa Rosa, CA, USA
Abstract :
We present a record-breaking performance of an ultra-low stress 8-skip-0 100GHz thin film filter enabled by a new coating process. The coating has 17 cavities, over 400 quarter-wave layers, and a physical thickness of 94 micrometers.
Keywords :
interference filters; optical communication equipment; optical films; optical waveguide filters; vapour deposition; 94 micron; coating process; enabling technology; extreme performance; optical thin film interference filters; physical thickness; quarter-wave layers; record-breaking performance; ultra-low stress coating process; Band pass filters; Bandwidth; Coatings; Interference; Optical fiber filters; Optical fibers; Optical films; Sputtering; Stress; Transistors;
Conference_Titel :
Optical Fiber Communication Conference and Exhibit, 2002. OFC 2002
Print_ISBN :
1-55752-701-6
DOI :
10.1109/OFC.2002.1036757
