DocumentCode :
2308380
Title :
The Future Of Plasma Processing in Microelectronic Fabrication
Author :
Herb, S.K.
Author_Institution :
AT&T Bell Laboratories
fYear :
1991
fDate :
3-5 June 1991
Firstpage :
133
Lastpage :
133
Keywords :
Environmental economics; Fabrication; Fuel economy; Legislation; Microelectronics; Plasma applications; Plasma devices; Plasma materials processing; Power generation economics; Proposals;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1991. IEEE Conference Record - Abstracts., 1991 IEEE International Conference on
Conference_Location :
Williamsburg, VA, USA
Print_ISBN :
0-7803-0147-1
Type :
conf
DOI :
10.1109/PLASMA.1991.695577
Filename :
695577
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2308380
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