Title :
The Dependence Of Integrated Electron Line Density on the Absorbed Power for Different Gases in the GEC RF Standard Plasma Processing Research Reactor
Author :
Bletzinger, P. ; Garscadden, A. ; Cooper, Daniel ; Andrews, M.L.
Author_Institution :
Wright-Patterson AFB
Keywords :
Argon; Electrons; Gases; Inductors; Nitrogen; Optical modulation; Plasma density; Plasma materials processing; Power measurement; Pressure measurement;
Conference_Titel :
Plasma Science, 1991. IEEE Conference Record - Abstracts., 1991 IEEE International Conference on
Conference_Location :
Williamsburg, VA, USA
Print_ISBN :
0-7803-0147-1
DOI :
10.1109/PLASMA.1991.695585
