DocumentCode
2308499
Title
The Dependence Of Integrated Electron Line Density on the Absorbed Power for Different Gases in the GEC RF Standard Plasma Processing Research Reactor
Author
Bletzinger, P. ; Garscadden, A. ; Cooper, Daniel ; Andrews, M.L.
Author_Institution
Wright-Patterson AFB
fYear
1991
fDate
3-5 June 1991
Firstpage
136
Lastpage
137
Keywords
Argon; Electrons; Gases; Inductors; Nitrogen; Optical modulation; Plasma density; Plasma materials processing; Power measurement; Pressure measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 1991. IEEE Conference Record - Abstracts., 1991 IEEE International Conference on
Conference_Location
Williamsburg, VA, USA
Print_ISBN
0-7803-0147-1
Type
conf
DOI
10.1109/PLASMA.1991.695585
Filename
695585
Link To Document