Title :
The Ion Distribution Function in Weakly Collisional Sheaths
Author :
Hamaguchi, S. ; Dalvie, M. ; Farouki, R.T.
Keywords :
Distribution functions; Etching; Fabrication; Plasma applications; Plasma density; Plasma devices; Plasma materials processing; Plasma properties; Plasma sheaths; Plasma simulation;
Conference_Titel :
Plasma Science, 1991. IEEE Conference Record - Abstracts., 1991 IEEE International Conference on
Conference_Location :
Williamsburg, VA, USA
Print_ISBN :
0-7803-0147-1
DOI :
10.1109/PLASMA.1991.695587