DocumentCode :
2308589
Title :
A Review Of ECR Plasma Processing Technology
Author :
Asmussen, J.
Author_Institution :
Michigan State University
fYear :
1991
fDate :
3-5 June 1991
Firstpage :
139
Lastpage :
139
Keywords :
Electromagnetic launching; Electrons; Etching; Inductors; Plasma applications; Plasma density; Plasma materials processing; Plasma measurements; Plasma properties; Plasma waves;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1991. IEEE Conference Record - Abstracts., 1991 IEEE International Conference on
Conference_Location :
Williamsburg, VA, USA
Print_ISBN :
0-7803-0147-1
Type :
conf
DOI :
10.1109/PLASMA.1991.695590
Filename :
695590
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2308589
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