DocumentCode
2308985
Title
Post-production performance calibration in analog/RF devices
Author
Kupp, Nathan ; Huang, He ; Drineas, Petros ; Makris, Yiorgos
Author_Institution
Dept. of Electr. Eng., Yale Univ., New Haven, CT, USA
fYear
2010
fDate
2-4 Nov. 2010
Firstpage
1
Lastpage
10
Abstract
In semiconductor device fabrication, continual demand for high performance, high yield devices has caused designers to look to post-production tunable circuits as the next logical step in analog/RF design and test development. These approaches have not yet achieved the maturity necessary for industrial adoption, primarily due to complexity and cost. In this work, we develop a general model which systematically outlines several key observations constraining the complexity of performance calibration in analog/RF devices. Moreover, we develop a detailed cost model permitting direct comparison of performance calibration methods to industry standard specification testing. Our analysis is demonstrated on a tunable RF LNA device simulated in 0.18μm RFCMOS.
Keywords
CMOS integrated circuits; analogue circuits; calibration; low noise amplifiers; radiofrequency amplifiers; RFCMOS; analog-RF devices; industry standard specification testing; post-production performance calibration; size 0.18 mum; tunable RF LNA device;
fLanguage
English
Publisher
ieee
Conference_Titel
Test Conference (ITC), 2010 IEEE International
Conference_Location
Austin, TX
ISSN
1089-3539
Print_ISBN
978-1-4244-7206-2
Type
conf
DOI
10.1109/TEST.2010.5699225
Filename
5699225
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