DocumentCode :
2308985
Title :
Post-production performance calibration in analog/RF devices
Author :
Kupp, Nathan ; Huang, He ; Drineas, Petros ; Makris, Yiorgos
Author_Institution :
Dept. of Electr. Eng., Yale Univ., New Haven, CT, USA
fYear :
2010
fDate :
2-4 Nov. 2010
Firstpage :
1
Lastpage :
10
Abstract :
In semiconductor device fabrication, continual demand for high performance, high yield devices has caused designers to look to post-production tunable circuits as the next logical step in analog/RF design and test development. These approaches have not yet achieved the maturity necessary for industrial adoption, primarily due to complexity and cost. In this work, we develop a general model which systematically outlines several key observations constraining the complexity of performance calibration in analog/RF devices. Moreover, we develop a detailed cost model permitting direct comparison of performance calibration methods to industry standard specification testing. Our analysis is demonstrated on a tunable RF LNA device simulated in 0.18μm RFCMOS.
Keywords :
CMOS integrated circuits; analogue circuits; calibration; low noise amplifiers; radiofrequency amplifiers; RFCMOS; analog-RF devices; industry standard specification testing; post-production performance calibration; size 0.18 mum; tunable RF LNA device;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Test Conference (ITC), 2010 IEEE International
Conference_Location :
Austin, TX
ISSN :
1089-3539
Print_ISBN :
978-1-4244-7206-2
Type :
conf
DOI :
10.1109/TEST.2010.5699225
Filename :
5699225
Link To Document :
بازگشت