• DocumentCode
    2310097
  • Title

    DFM aware bridge pair extraction for manufacturing test development

  • Author

    Sarveswara, Tammali ; Khatri, Vishal ; Shanmugam, Gowrysankar ; Terry, Mark

  • Author_Institution
    Texas Instrum. Inc., Dallas, TX, USA
  • fYear
    2010
  • fDate
    2-4 Nov. 2010
  • Firstpage
    1
  • Lastpage
    1
  • Abstract
    We propose a novel method to extract bridge pairs for manufacturing test development based on litho hotspots obtained from DFM (Design-For-Manufacturability) litho models. Litho hotspots are locations in a physical layout in which the lithography process margin is relatively small. We use a DFM lithography simulator to identify litho hotspots and map them onto the design database to identify the associated nets. These nets are then used to select prioritized bridging pairs from extracted capacitive coupling based bridge pairs.
  • Keywords
    design for manufacture; lithography; semiconductor device manufacture; DFM; bridge pair extraction; capacitive coupling; design- for-manufacturability; litho hotspots models; lithography process; manufacturing test development;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Test Conference (ITC), 2010 IEEE International
  • Conference_Location
    Austin, TX
  • ISSN
    1089-3539
  • Print_ISBN
    978-1-4244-7206-2
  • Type

    conf

  • DOI
    10.1109/TEST.2010.5699304
  • Filename
    5699304