DocumentCode :
2310097
Title :
DFM aware bridge pair extraction for manufacturing test development
Author :
Sarveswara, Tammali ; Khatri, Vishal ; Shanmugam, Gowrysankar ; Terry, Mark
Author_Institution :
Texas Instrum. Inc., Dallas, TX, USA
fYear :
2010
fDate :
2-4 Nov. 2010
Firstpage :
1
Lastpage :
1
Abstract :
We propose a novel method to extract bridge pairs for manufacturing test development based on litho hotspots obtained from DFM (Design-For-Manufacturability) litho models. Litho hotspots are locations in a physical layout in which the lithography process margin is relatively small. We use a DFM lithography simulator to identify litho hotspots and map them onto the design database to identify the associated nets. These nets are then used to select prioritized bridging pairs from extracted capacitive coupling based bridge pairs.
Keywords :
design for manufacture; lithography; semiconductor device manufacture; DFM; bridge pair extraction; capacitive coupling; design- for-manufacturability; litho hotspots models; lithography process; manufacturing test development;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Test Conference (ITC), 2010 IEEE International
Conference_Location :
Austin, TX
ISSN :
1089-3539
Print_ISBN :
978-1-4244-7206-2
Type :
conf
DOI :
10.1109/TEST.2010.5699304
Filename :
5699304
Link To Document :
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