DocumentCode
2310097
Title
DFM aware bridge pair extraction for manufacturing test development
Author
Sarveswara, Tammali ; Khatri, Vishal ; Shanmugam, Gowrysankar ; Terry, Mark
Author_Institution
Texas Instrum. Inc., Dallas, TX, USA
fYear
2010
fDate
2-4 Nov. 2010
Firstpage
1
Lastpage
1
Abstract
We propose a novel method to extract bridge pairs for manufacturing test development based on litho hotspots obtained from DFM (Design-For-Manufacturability) litho models. Litho hotspots are locations in a physical layout in which the lithography process margin is relatively small. We use a DFM lithography simulator to identify litho hotspots and map them onto the design database to identify the associated nets. These nets are then used to select prioritized bridging pairs from extracted capacitive coupling based bridge pairs.
Keywords
design for manufacture; lithography; semiconductor device manufacture; DFM; bridge pair extraction; capacitive coupling; design- for-manufacturability; litho hotspots models; lithography process; manufacturing test development;
fLanguage
English
Publisher
ieee
Conference_Titel
Test Conference (ITC), 2010 IEEE International
Conference_Location
Austin, TX
ISSN
1089-3539
Print_ISBN
978-1-4244-7206-2
Type
conf
DOI
10.1109/TEST.2010.5699304
Filename
5699304
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