• DocumentCode
    23106
  • Title

    A Comparative Study of Different Physics-Based NBTI Models

  • Author

    Mahapatra, Santanu ; Goel, Nishith ; Desai, Shaishav ; Gupta, Swastik ; Jose, B. ; Mukhopadhyay, Saibal ; Joshi, Kishor ; Jain, Abhishek ; Islam, Ahmad Ehteshamul ; Alam, Md. Ashraful

  • Author_Institution
    Dept. of Electr. Eng., Indian Inst. of Technol. Bombay, Mumbai, India
  • Volume
    60
  • Issue
    3
  • fYear
    2013
  • fDate
    Mar-13
  • Firstpage
    901
  • Lastpage
    916
  • Abstract
    Different physics-based negative bias temperature instability (NBTI) models as proposed in the literature are reviewed, and the predictive capability of these models is benchmarked against experimental data. Models that focus exclusively on hole trapping in gate-insulator-process-related preexisting traps are found to be inconsistent with direct experimental evidence of interface trap generation. Models that focus exclusively on interface trap generation are incapable of predicting ultrafast measurement data. Models that assume strong correlation between interface trap generation and hole trapping in switching hole traps cannot simultaneously predict long-time dc stress, recovery, and ac stress and cannot estimate gate insulator process impact. Uncorrelated contributions from generation and recovery of interface traps, together with hole trapping and detrapping in preexisting and newly generated bulk insulator traps, are invoked to comprehensively predict dc stress and recovery, ac duty cycle and frequency, and gate insulator process impact of NBTI. The reaction-diffusion model can accurately predict generation and recovery of interface traps for different devices and experimental conditions. Hole trapping/detrapping is modeled using a two-level energy well model.
  • Keywords
    MOSFET; hole traps; negative bias temperature instability; reaction-diffusion systems; semiconductor device models; ac duty cycle; bulk insulator traps; dc stress; different physics-based NBTI models; gate-insulator-process-related preexisting traps; hole detrapping; hole trapping; interface trap generation; negative bias temperature instability; predictive capability; reaction-diffusion; switching hole traps; two-level energy well model; ultrafast measurement data; uncorrelated contributions; Insulators; Logic gates; Pollution measurement; Predictive models; Stress; Stress measurement; Time measurement; HKMG; SiON; hole trapping; interface traps; negative bias temperature instability (NBTI); reaction–diffusion (RD) model; two-stage model; two-well model;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2013.2238237
  • Filename
    6417017