DocumentCode
23106
Title
A Comparative Study of Different Physics-Based NBTI Models
Author
Mahapatra, Santanu ; Goel, Nishith ; Desai, Shaishav ; Gupta, Swastik ; Jose, B. ; Mukhopadhyay, Saibal ; Joshi, Kishor ; Jain, Abhishek ; Islam, Ahmad Ehteshamul ; Alam, Md. Ashraful
Author_Institution
Dept. of Electr. Eng., Indian Inst. of Technol. Bombay, Mumbai, India
Volume
60
Issue
3
fYear
2013
fDate
Mar-13
Firstpage
901
Lastpage
916
Abstract
Different physics-based negative bias temperature instability (NBTI) models as proposed in the literature are reviewed, and the predictive capability of these models is benchmarked against experimental data. Models that focus exclusively on hole trapping in gate-insulator-process-related preexisting traps are found to be inconsistent with direct experimental evidence of interface trap generation. Models that focus exclusively on interface trap generation are incapable of predicting ultrafast measurement data. Models that assume strong correlation between interface trap generation and hole trapping in switching hole traps cannot simultaneously predict long-time dc stress, recovery, and ac stress and cannot estimate gate insulator process impact. Uncorrelated contributions from generation and recovery of interface traps, together with hole trapping and detrapping in preexisting and newly generated bulk insulator traps, are invoked to comprehensively predict dc stress and recovery, ac duty cycle and frequency, and gate insulator process impact of NBTI. The reaction-diffusion model can accurately predict generation and recovery of interface traps for different devices and experimental conditions. Hole trapping/detrapping is modeled using a two-level energy well model.
Keywords
MOSFET; hole traps; negative bias temperature instability; reaction-diffusion systems; semiconductor device models; ac duty cycle; bulk insulator traps; dc stress; different physics-based NBTI models; gate-insulator-process-related preexisting traps; hole detrapping; hole trapping; interface trap generation; negative bias temperature instability; predictive capability; reaction-diffusion; switching hole traps; two-level energy well model; ultrafast measurement data; uncorrelated contributions; Insulators; Logic gates; Pollution measurement; Predictive models; Stress; Stress measurement; Time measurement; HKMG; SiON; hole trapping; interface traps; negative bias temperature instability (NBTI); reaction–diffusion (RD) model; two-stage model; two-well model;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2013.2238237
Filename
6417017
Link To Document