DocumentCode
2311282
Title
Design of a high fill-factor micromachined bolometer for thermal imaging applications
Author
Safy, M. ; Zaky, A. Hafz
Author_Institution
Dept. of Electron., Mil. Tech. Coll., Egypt
fYear
2010
fDate
20-22 Oct. 2010
Firstpage
1
Lastpage
4
Abstract
This paper reports a novel design of a microchined bolometer for thermal imaging applications. The thermal modeling and stress analysis of infrared radiation bolometer which is made of a thin film of aSi:H has been performed using FLUENT(6.1) and ANSYS (11) CFD programs respectively. This bolometer is realized in a multilevel electro thermal structure having a high fill factor. Using the multilevel structure, thermal isolation can be independently optimized without sacrificing the IR absorption area. The analysis showed that optimization of the arm dimensions can be done without failure of structure breakdown or buckling. The design shows that the thermal time constant is 12.95 ms, the responsivity is of 4.65×103 V/W, and the detcetivity is of 7.97×108 cm Hz1/2 w-1 which can be achieved in a 50μm×50μm michromachined structure.
Keywords
amorphous semiconductors; bolometers; buckling; infrared detectors; infrared imaging; optimisation; semiconductor thin films; stress analysis; buckling; fill factor; infrared radiation bolometer; micromachined bolometer; optimization; size 50 mum; stress analysis; structure breakdown; thermal imaging; thermal isolation; thermal modeling; thin film; time 12.95 ms; Amorphous silicon; Bolometers; Computational fluid dynamics; Detectors; Films; Stress; Bolometer-Infreared-Thermal modeling; Stress Analysis-Micromachined-Detectors-FEA;
fLanguage
English
Publisher
ieee
Conference_Titel
Microsystems Packaging Assembly and Circuits Technology Conference (IMPACT), 2010 5th International
Conference_Location
Taipei
ISSN
2150-5934
Print_ISBN
978-1-4244-9783-6
Electronic_ISBN
2150-5934
Type
conf
DOI
10.1109/IMPACT.2010.5699494
Filename
5699494
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