DocumentCode :
2311487
Title :
Investigation of Sn whisker growth in the matte Sn/Alloy 42 substrate coated different metallic layers
Author :
Tsou, Meng-Yu ; Yen, Yee-wen ; Shao, Pei-Sheng ; Jao, Chien-Chung
Author_Institution :
Dept. of Mater. Sci. & Eng., Nat. Taiwan Univ. of Sci. & Technol., Taipei, Taiwan
fYear :
2010
fDate :
20-22 Oct. 2010
Firstpage :
1
Lastpage :
4
Abstract :
In this study, the multi-layer structure effect on the Sn whisker growth in the matte Sn/Fe-42 wt% Ni (Alloy 42) systems was investigated. The Alloy 42 substrates were electroplated with 1.8 μm-thick of the Cu layer (CuE), electrolessplated with 0.3 μm μm-thick Cu layer (CuC), and electroplated with 1.8 μm-thick Ni layer, respectively. Thus, 4 kinds of multilayer specimens, CuE/Sn/Alloy 42, CuC/Sn/Alloy 42, Ni/Sn/Alloy 42, and Sn/Alloy 42 were prepared. The thermal treatment at 60 °C for 500 hours and thermal cycling test from -35 to 85°C were applied to each specimen. After 500 times thermal cycles, Sn whiskers can be observed on the substrate surface. Increasing numbers of the thermal cycle produces more thermal stress to induce the Sn whisker formation. The order of the Sn whisker length and density in each specimen is: Sn/Alloy 42>;Sn/CuE/Alloy 42>;Sn/CuC/Alloy 42. No Sn whiskers were formed in the Ni/Sn/Alloy 42 system. This result indicates that Sn atoms diffuse toward the Ni layer to induce the tension stress. This tension stress could mitigate the thermal stress to inhibit the Sn whisker formation.
Keywords :
analogue circuits; copper; electroplated coatings; electroplating; heat treatment; iron alloys; metallic thin films; multilayers; nickel; nickel alloys; thermal stresses; whiskers (crystal); Cu-Sn-FeNi; Ni-Sn-FeNi; electroplating; metallic layers; multilayer structure effect; temperature -35 degC to 85 degC; tension stress; thermal cycling; thermal stress; thermal treatment; time 500 hour; whisker growth; Nickel; Stress; Substrates; Surface morphology; Thermal stresses; Tin; Fe-42 wt% Ni (Alloy 42); Sn whisker; multi-layer structure; thermal cycling test; thermal stress;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microsystems Packaging Assembly and Circuits Technology Conference (IMPACT), 2010 5th International
Conference_Location :
Taipei
ISSN :
2150-5934
Print_ISBN :
978-1-4244-9783-6
Electronic_ISBN :
2150-5934
Type :
conf
DOI :
10.1109/IMPACT.2010.5699508
Filename :
5699508
Link To Document :
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