DocumentCode :
2312032
Title :
High spatial resolution subsurface microscopy using radially polarized beam
Author :
Yurt, Abdulkadir ; Grogan, Michael D W ; Lu, Yang ; Ramsay, Euan ; Ünlü, M. Selim ; Ramachandran, Siddharth ; Goldberg, Bennett B.
Author_Institution :
Photonics Center, Boston Univ., Boston, MA, USA
fYear :
2012
fDate :
23-27 Sept. 2012
Firstpage :
830
Lastpage :
831
Abstract :
We experimentally study spot size reduction by using radially polarized beam for subsurface silicon integrated circuit microscopy. Metallic lines fabricated on a silicon substrate with linewidth / spacing ~ 130nm / 70nm were resolved through the substrate at λ0 = 1310nm.
Keywords :
elemental semiconductors; integrated optics; light polarisation; optical fabrication; optical microscopy; silicon; Si; metallic lines fabrication; radially polarized beam; silicon substrate; spatial resolution subsurface microscopy; spot size reduction; subsurface silicon integrated circuit microscopy; wavelength 1310 nm; Apertures; Image resolution; Laser beams; Microscopy; Optical imaging; Optical polarization; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photonics Conference (IPC), 2012 IEEE
Conference_Location :
Burlingame, CA
Print_ISBN :
978-1-4577-0731-5
Type :
conf
DOI :
10.1109/IPCon.2012.6359251
Filename :
6359251
Link To Document :
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