• DocumentCode
    2312312
  • Title

    Experimental and theoretical modeling of runaway electron damage for the design of tokamak plasma facing components

  • Author

    Niemer, K.A. ; Gilligan, J.G. ; Croessmann, C.D.

  • Author_Institution
    Dept. of Nucl. Eng., North Carolina State Univ., Raleigh, NC, USA
  • fYear
    1989
  • fDate
    0-0 1989
  • Firstpage
    60
  • Abstract
    Summary Form only given, as follows. Damage of tokamak components and materials due to high-energy runaway electrons (20-150 MeV) during disruptions is being investigated. A computational model of the effect of the runaway electrons is being used to predict the energy deposition and damage on tokamak first wall and limiter materials. The results from this model will be used to design components that can withstand high energy runaway electron damage. To date, parametric studies of electron energy, incident angle, current, and deposition time have been performed to determine their effect on energy deposition and temperature rise in various materials (including graphite, zirconium, molybdenum, tungsten, beryllium). The conclusion is that an optimum material would have a high melting temperature, high thermal conductivity, and the capability to scatter high-energy electrons into a large volume. The temperature rises predicted by the model agreed favorably with experimental temperature rises. In addition to modeling damage due to melting and sublimation, investigation of other damage mechanisms is underway.<>
  • Keywords
    Tokamak devices; fusion reactor materials; fusion reactor theory and design; plasma-wall interactions; 20 to 150 MeV; Be; C; Mo; W; Zr; computational model; damage mechanisms; design; energy deposition; first wall; high melting temperature; high thermal conductivity; limiter materials; melting; parametric studies; runaway electron damage; sublimation; theoretical modeling; tokamak plasma facing components; Tokamaks;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1989. IEEE Conference Record - Abstracts., 1989 IEEE International Conference on
  • Conference_Location
    Buffalo, NY, USA
  • Type

    conf

  • DOI
    10.1109/PLASMA.1989.166023
  • Filename
    166023