• DocumentCode
    2312919
  • Title

    Tunable internal photoemission sensor using silicide/silicon heterostructures

  • Author

    Sagnes, I. ; Campidelli, Y. ; Chevalier, F. ; Badoz, P.A.

  • Author_Institution
    CNET, France Telecom, Meylan, France
  • fYear
    1993
  • fDate
    5-8 Dec. 1993
  • Firstpage
    912
  • Lastpage
    914
  • Abstract
    A new silicide/silicon IR detector is presented which has the potential for multicolor detection due to the tunability of its photoresponse and cutoff wavelength. This tunable internal photoemission sensor (TIPS) consists of two back-to-back Schottky diodes separated by a thin undoped Si layer. The two metals are chosen with different Schottky barrier heights so that the depleted Si forms an asymmetrical potential barrier to the carriers (both holes and electrons) photocreated in each metallic film. Under sub-band gap illumination the photocurrent flowing between the two metallic films is therefore strongly dependent on the shape and height of the potential barrier which can be varied by a small bias applied between the two metal electrodes.<>
  • Keywords
    Schottky-barrier diodes; erbium compounds; infrared detectors; iridium; metallic thin films; optical sensors; photoemission; silicon; silicon compounds; Ir-Si-ErSi/sub 2/; Schottky barrier heights; Si-ErSi/sub 2/; asymmetrical potential barrier; back-to-back Schottky diodes; cutoff wavelength; depleted Si forms; electrons; holes; metal electrodes; metallic film; multicolor detection; photocreated; photocurrent flow; photoresponse; silicide/silicon IR detector; silicide/silicon heterostructures; small bias; sub-band gap illumination; thin undoped Si layer; tunability; tunable internal photoemission sensor; Charge carrier processes; Infrared detectors; Lighting; Photoconductivity; Photoelectricity; Schottky barriers; Schottky diodes; Semiconductor films; Silicides; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1993. IEDM '93. Technical Digest., International
  • Conference_Location
    Washington, DC, USA
  • ISSN
    0163-1918
  • Print_ISBN
    0-7803-1450-6
  • Type

    conf

  • DOI
    10.1109/IEDM.1993.347252
  • Filename
    347252