DocumentCode :
2313291
Title :
Interfacial reaction at 250°C in the Sn/Ni-7wt.%V couple
Author :
Lin, Yu-ren ; Pan, Kai-wen ; Wu, Hsin-jay ; Chen, Sinn-wen
Author_Institution :
Dept. of Chem. Eng., Nat. Tsing Hua Univ., Hsinchu, Taiwan
fYear :
2010
fDate :
20-22 Oct. 2010
Firstpage :
1
Lastpage :
4
Abstract :
Sn is the base element of all the promising electronic solders, and Ni-7wt.%V is the major diffusion barrier layer material of flip chip technology. Interfacial reactions in the Sn/Ni-7wt.%V couple at 250°C are examined in this study. The Ni3Sn4 phase is observed in the Sn matrix. Two phase layers, Sn-Ni-V ternary phase (T phase) and a mixture of the nano-crystalline V2Sn3 phase and Sn phase (T2 phase), are observed at the Sn/Ni-7wt.%V interface. The micro structures of T phase and T2 phase was analyzed by TEM, T phase has a dense structure and T2 phase has a loose structure. The loose structure of Sn-V phase can not only cause a harmful effect on mechanical properties, but also on electrical properties.
Keywords :
diffusion; flip-chip devices; electrical properties; electronic solders; flip chip technology; interfacial reactions; loose structure; major diffusion barrier layer material; mechanical properties; microstructures; nanocrystalline phase; phase layers; ternary phase; Mechanical factors; Nickel; Substrates; Tin; Transmission electron microscopy; Interfacial reactions; Ni-7wt.%V; Sn; V2Sn3; ternary phase;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microsystems Packaging Assembly and Circuits Technology Conference (IMPACT), 2010 5th International
Conference_Location :
Taipei
ISSN :
2150-5934
Print_ISBN :
978-1-4244-9783-6
Electronic_ISBN :
2150-5934
Type :
conf
DOI :
10.1109/IMPACT.2010.5699617
Filename :
5699617
Link To Document :
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