Title :
A room-temperature single-electron memory device using fine-grain polycrystalline silicon
Author :
Yano, K. ; Ishii, T. ; Hashimoto, T. ; Kobayashi, T. ; Murai, F. ; Seki, K.
Author_Institution :
Central Res. Lab., Hitachi Ltd., Tokyo, Japan
Abstract :
The first room-temperature operation is demonstrated of a single-electron memory device, in which an electron represents one-bit information. This is made possible due to our new one-transistor memory configuration (conventionally three circuit elements are needed), which has very high charge sensitivity. Another new technique, which stabilizes the one-electron stored state, is ultra-thin (4 nm) poly-Si film for the active region, in which an array of 10-nm grains are naturally formed. In the fabricated poly-Si TFTs a single electron is systematically stored (or "written") with every 15-V gate-voltage increase, and the number of stored electrons is counted (or "read") by the quantized threshold-voltage shift. The single-electron memory provides a new non-volatile RAM, which is very suitable for mobile computers/communicators.<>
Keywords :
elemental semiconductors; quantum interference devices; random-access storage; semiconductor storage; silicon; thin film transistors; Si; charge sensitivity; fine-grain polycrystalline silicon; mobile communicators; mobile computers; nonvolatile RAM; one-electron stored state; one-transistor memory; poly-Si TFTs; quantized threshold-voltage shift; room-temperature operation; single-electron memory device; ultra-thin film; Buffer storage; Circuits; Nonvolatile memory; Random access memory; Silicon; Single electron devices; Single electron memory; Temperature; Threshold voltage; Ultra large scale integration;
Conference_Titel :
Electron Devices Meeting, 1993. IEDM '93. Technical Digest., International
Conference_Location :
Washington, DC, USA
Print_ISBN :
0-7803-1450-6
DOI :
10.1109/IEDM.1993.347292