Title :
A high sensitive Fabry-Perot shear stress sensor employing flexible membrane and double SU-8 structures
Author :
Tseng, Fan-Gang ; Lin, ChunJ-un
Author_Institution :
ESS Dept., Nat. Tsing Hua Univ., Hsinchu, Taiwan
Abstract :
This paper reports a novel shear stress sensor utilizing flexible membrane and double SU-8 resist structures as a Fabry-Perot interferometer. Through UV lithography on thick resist, the surface roughness of the reflection surface was better than 7 nm (Ra value trough 10*10 μm2 area), suitable for optical application. A single mode optical fiber was employed for detecting the displacement of the floating element representing the shear stress force on the flexible membrane. A test has been successfully carried out and demonstrated the possibility of detection of a 10 nm displacement, representing a minimum detectable wall shear stress of 0.065 Pa from simulation, comparable to its counterparts with resolutions from 0.1-1 Pa.
Keywords :
Fabry-Perot interferometers; fibre optic sensors; membranes; microsensors; photoresists; sensitivity; stress measurement; ultraviolet lithography; 0.065 Pa; 0.1 to 1 Pa; 10 nm; 7 nm; Fabry-Perot interferometer; Fabry-Perot shear stress sensor; MEMS technology; UV lithography; displacement detection; double SU-8 resist structures; flexible membrane; high sensitivity shear stress sensor; optical fiber sensor; single mode optical fiber; Biomembranes; Fabry-Perot interferometers; Lithography; Optical interferometry; Optical reflection; Optical sensors; Resists; Rough surfaces; Stress; Surface roughness;
Conference_Titel :
Sensors, 2002. Proceedings of IEEE
Print_ISBN :
0-7803-7454-1
DOI :
10.1109/ICSENS.2002.1037241