DocumentCode
2313780
Title
Temperature effects on electromigration behavior of solder joints
Author
Ke, Jia-Hong ; Kao, C. Robert
Author_Institution
Dept. of Mater. Sci. & Eng., Nat. Taiwan Univ., Taipei, Taiwan
fYear
2010
fDate
20-22 Oct. 2010
Firstpage
1
Lastpage
4
Abstract
Void formation, intermetallic compound dissolution and metallization consumption at cathode interface are major degradation processes of electromigration in solder joints, but decisive factors for the phenomena are not clear. The article provides a new perspective to describe the electromigration behavior. We analyzed the temperature effects on Cu and Sn electromigration fluxes in Sn. The calculated result showed low temperature retards Sn electromigration flux by three orders of magnitude more effectively than Cu, which implied intermetallic compound dissolution and metallization consumption at cathode will be the dominant feature at low temperature. The calculated result was verified by low temperature electromigration tests in flip chip solder joint.
Keywords
cathodes; electromigration; flip-chip devices; metallisation; solders; cathode interface; degradation process; electromigration behavior; electromigration flux; electromigration tests; flip chip solder joint; intermetallic compound dissolution; low temperature retards; metallization consumption; solder joints; temperature effects; void formation; Cathodes; Copper; Current density; Electromigration; Intermetallic; Metallization; Tin;
fLanguage
English
Publisher
ieee
Conference_Titel
Microsystems Packaging Assembly and Circuits Technology Conference (IMPACT), 2010 5th International
Conference_Location
Taipei
ISSN
2150-5934
Print_ISBN
978-1-4244-9783-6
Electronic_ISBN
2150-5934
Type
conf
DOI
10.1109/IMPACT.2010.5699647
Filename
5699647
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