• DocumentCode
    2313780
  • Title

    Temperature effects on electromigration behavior of solder joints

  • Author

    Ke, Jia-Hong ; Kao, C. Robert

  • Author_Institution
    Dept. of Mater. Sci. & Eng., Nat. Taiwan Univ., Taipei, Taiwan
  • fYear
    2010
  • fDate
    20-22 Oct. 2010
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    Void formation, intermetallic compound dissolution and metallization consumption at cathode interface are major degradation processes of electromigration in solder joints, but decisive factors for the phenomena are not clear. The article provides a new perspective to describe the electromigration behavior. We analyzed the temperature effects on Cu and Sn electromigration fluxes in Sn. The calculated result showed low temperature retards Sn electromigration flux by three orders of magnitude more effectively than Cu, which implied intermetallic compound dissolution and metallization consumption at cathode will be the dominant feature at low temperature. The calculated result was verified by low temperature electromigration tests in flip chip solder joint.
  • Keywords
    cathodes; electromigration; flip-chip devices; metallisation; solders; cathode interface; degradation process; electromigration behavior; electromigration flux; electromigration tests; flip chip solder joint; intermetallic compound dissolution; low temperature retards; metallization consumption; solder joints; temperature effects; void formation; Cathodes; Copper; Current density; Electromigration; Intermetallic; Metallization; Tin;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microsystems Packaging Assembly and Circuits Technology Conference (IMPACT), 2010 5th International
  • Conference_Location
    Taipei
  • ISSN
    2150-5934
  • Print_ISBN
    978-1-4244-9783-6
  • Electronic_ISBN
    2150-5934
  • Type

    conf

  • DOI
    10.1109/IMPACT.2010.5699647
  • Filename
    5699647