Redox reaction imaging using THz chemical microscope

Author

Minami, Yasuo ; Kiwa, Toshihiko ; Kawayama, Iwao ; Tonouchi, M. ; Tsukada, Keiji

Author_Institution

Grad. Sch., Natural Sci. & Technol., Okayama Univ., Okayama, Japan

fYear

2009

fDate

21-25 Sept. 2009

Firstpage

1

Lastpage

3

Abstract

Terahertz chemical microscope was carried out to visualize the distribution of the redox reaction of the immobilized-enzyme. The urease films with the spot size of 3, 2, 1 mm in diameter were immobilized on a SiO₂/Si/Sapphire layered device and the laser-excited terahertz radiation from the Si layer was observed, which can be related to the chemical potential shift of the SiO₂ surface. The redox reaction between the urease and the urea solution was successfully measured.

Keywords

biochemistry; biological techniques; enzymes; laser beam applications; oxidation; reduction (chemical); sapphire; silicon; silicon compounds; THz chemical microscope; chemical potential shift; immobilized-enzyme; laser-excited terahertz radiation; redox reaction imaging; urease film; Chemical lasers; Chemical technology; Cities and towns; Microscopy; Optical surface waves; Semiconductor device measurement; Semiconductor films; Substrates; Surface emitting lasers; Visualization;

fLanguage

English

Publisher

ieee

Conference_Titel

Infrared, Millimeter, and Terahertz Waves, 2009. IRMMW-THz 2009. 34th International Conference on

Conference_Location

Busan

Print_ISBN

978-1-4244-5416-7

Electronic_ISBN

978-1-4244-5417-4

Type

conf

DOI

10.1109/ICIMW.2009.5324691

Filename

5324691