Title :
Photolithographic sol-gel materials with high resolution and optical transparency for waveguides
Author :
Tamaki, Kimitoshi ; Utaka, T. ; Takase, Hiroshi
Author_Institution :
Tsukuba Res. Lab., JSR Corp., Ibaraki, Japan
Abstract :
Novel polysiloxane-based materials with high resolution and optical transparency have been developed. The optical waveguides with precise core patterns have been fabricated using photolithographic technique and indicated low propagation losses at 1.310 and 1.550 μm.
Keywords :
gels; optical fibre fabrication; optical fibre losses; optical fibre theory; optical polymers; photolithography; 1.310 micron; 1.550 micron; low propagation losses; optical transparency; optical waveguides; photolithographic sol-gel materials; photolithographic technique; polysiloxane-based materials; precise core patterns; Arrayed waveguide gratings; Optical device fabrication; Optical devices; Optical materials; Optical polymers; Optical refraction; Optical variables control; Optical waveguides; Propagation losses; Refractive index;
Conference_Titel :
Optical Fiber Communications Conference, 2003. OFC 2003
Print_ISBN :
1-55752-746-6
DOI :
10.1109/OFC.2003.1247490
