DocumentCode
2316372
Title
Directly UV-written planar channel waveguides containing simultaneously defined Bragg gratings
Author
Emmerson, G. ; Watts, S. ; Gawith, C. ; Riziotis, C. ; Fu, A. ; Williams, R. ; Smith, P. ; Albanis, V. ; Ibsen, M.
Author_Institution
Optoelectron. Res. Centre, Southampton, UK
fYear
2003
fDate
23-28 March 2003
Firstpage
63
Abstract
A new technique for the simultaneous writing of channels and Bragg gratings uses interfering focused UV beams in a photosensitive silica layer and is able to fabricate near-ideal Bragg gratings, with 60% reflectivity.
Keywords
Bragg gratings; optical planar waveguides; reflectivity; silicon compounds; ultraviolet lithography; Bragg grating fabrication; SiO2; directly UV-written planar channel waveguides; photosensitive silica layer; reflectivity; Bragg gratings; Optical devices; Optical materials; Optical planar waveguides; Optical refraction; Optical waveguides; Planar waveguides; Polymers; Propagation losses; Writing;
fLanguage
English
Publisher
ieee
Conference_Titel
Optical Fiber Communications Conference, 2003. OFC 2003
Print_ISBN
1-55752-746-6
Type
conf
DOI
10.1109/OFC.2003.1247491
Filename
1247491
Link To Document