A non lithographic technique for the production of large area high density gridded field emission sources

Author

Holland, E.R. ; Harrison, M.T. ; Huang, M. ; Wilshaw, P.R.

Author_Institution

Dept. of Mater., Oxford Univ., UK

fYear

1998

fDate

19-24 July 1998

Firstpage

109

Lastpage

110

Abstract

We report a novel method for the production of high density arrays of gridded microtip field emission electron sources. The microporous structure of Al/sub 2/O/sub 3/, formed by anodisation of Aluminium, is exploited to provide a high density (10/sup 9/ sites cm/sup -2/) of sites for emitter fabrication without the need for individual lithographic patterning of each emitter. The small size of the resultant emitters enables operation with only moderate extraction voltage (20-50 V). Tests of groups of /spl ap/400,000 emitters have demonstrated emission current densities suitable for display applications.

Keywords

alumina; anodised layers; electron field emission; electron sources; porous materials; vacuum microelectronics; 20 to 50 V; Al/sub 2/O/sub 3/; FEA; anodisation; current density; fabrication; gridded microtip field emission electron source; large area high density array; microporous structure; nonlithographic technique; Aluminum; Biomembranes; Cathodes; Current density; Fabrication; Nickel; Production; Testing; Voltage; Wires;

fLanguage

English

Publisher

ieee

Conference_Titel

Vacuum Microelectronics Conference, 1998. Eleventh International

Conference_Location

Asheville, NC, USA

Print_ISBN

0-7803-5096-0

Type

conf

DOI

10.1109/IVMC.1998.728665

Filename

728665