DocumentCode
2320450
Title
Proactive BEOL yield improvement methodology for a successful mobile product
Author
Lee, Jong Hyun ; Lee, Jun Woo ; Lee, Nae-In ; Shen, Xumin ; Matsuhashi, Hideki ; Nehrer, William
Author_Institution
Syst. LSI Foundry Team, SAMSUNG Electron. Co. Ltd., Youngin, South Korea
fYear
2012
fDate
24-26 Sept. 2012
Firstpage
93
Lastpage
95
Abstract
Mobile products incorporating ever increasing functions and capabilities are often designed on new technologies nodes which can enable smaller chip size and therefore result in profitable production. In order to achieve rapid yield ramp up, new BEOL yield enhancement methodology was implemented for new mobile product introduction which adds preliminary GDS Hot spot analysis to develop test structures, short flow process characterization, and equipment sensor FDC analysis techniques to the traditional methods of yield improvement engineering. The methodology is suited for use in 28nm and beyond technology nodes because the statistically based discovery process can handle changes in process better than the traditional methodologies which rely solely on expert knowledge and limited infrastructure.
Keywords
consumer electronics; semiconductor device manufacture; semiconductor device testing; statistical analysis; BEOL yield enhancement methodology; GDS hot spot analysis; back-end-of-line; chip size; equipment sensor FDC analysis technique; flow process characterization; mobile product; proactive BEOL yield improvement methodology; profitable production; size 28 nm; statistics; test structure; yield improvement engineering; Mobile communication; BEOL; Defect Source Analysis (DSA); FDC; Printability; Random; Systematic; Test Vehicle; Wafer Equipment History(WEH); Yield methodology; Yield ramp up;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Conference Dresden-Grenoble (ISCDG), 2012 International
Conference_Location
Grenoble
Print_ISBN
978-1-4673-1717-7
Type
conf
DOI
10.1109/ISCDG.2012.6359982
Filename
6359982
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