DocumentCode :
2320712
Title :
Influence of the composition of NbNx thin film field emitter array on the emission characteristics
Author :
Nagao, M. ; Ura, T. ; Gotoh, Y. ; Tsuji, H. ; Ishikawa, J.
Author_Institution :
Dept. of Electron. Sci. & Eng., Kyoto Univ., Japan
fYear :
1998
fDate :
19-24 July 1998
Firstpage :
306
Lastpage :
307
Abstract :
Transition metal nitride has a potential for stable emission because of its chemical inertness, low work function and high melting point. We fabricated the NbN/sub x/ thin film field emitter arrays at relatively low temperature (500/spl deg/C) by ion beam assisted deposition technique. This technique can control the nitrogen composition of the film by selecting the deposition parameters. In this work, the relationship between the nitrogen composition of the NbN/sub x/ and emission characteristics was investigated.
Keywords :
electron field emission; ion beam assisted deposition; niobium compounds; vacuum microelectronics; 500 C; NbN; NbN/sub x/ thin film field emitter array; electron emission; ion beam assisted deposition; nitrogen composition; transition metal nitride; Aging; Field emitter arrays; Ion beams; Niobium; Nitrogen; Sputtering; Stability; Substrates; Temperature; Transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Microelectronics Conference, 1998. Eleventh International
Conference_Location :
Asheville, NC, USA
Print_ISBN :
0-7803-5096-0
Type :
conf
DOI :
10.1109/IVMC.1998.728770
Filename :
728770
Link To Document :
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