• DocumentCode
    2320828
  • Title

    Investigation of thickness effects on AlN coated metal tips by in situ I-V measurement

  • Author

    Kang, D.H. ; Zhirnov, V.V. ; Wojak, G. ; Choi, W.B. ; Hren, J.J. ; Cuomo, J.J.

  • Author_Institution
    Dept. of Mater. Sci. & Eng., North Carolina State Univ., Raleigh, NC, USA
  • fYear
    1998
  • fDate
    19-24 July 1998
  • Firstpage
    320
  • Lastpage
    321
  • Abstract
    The thickness of a deposited coating can be a critical factor in determining the emission characteristics of coated emitters. Several researchers have reported a thickness dependence of emission from emitters coated with wide band gap materials. Thus systematic I-V experiments are required, preferably using a single emitter with deposited layers of varying thickness. In the present study, the thickness effects of ultra thin AlN layers on Mo emitters was investigated using an in situ I-V measurement technique.
  • Keywords
    aluminium compounds; electron field emission; molybdenum; vacuum microelectronics; AlN coating; AlN-Mo; Mo emitter; in situ I-V measurement; metal tip; thickness effect; wide band gap material; Argon; Cleaning; Coatings; Crystallography; Materials science and technology; Measurement techniques; Plasma measurements; Pollution measurement; Thickness measurement; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Microelectronics Conference, 1998. Eleventh International
  • Conference_Location
    Asheville, NC, USA
  • Print_ISBN
    0-7803-5096-0
  • Type

    conf

  • DOI
    10.1109/IVMC.1998.728777
  • Filename
    728777