DocumentCode
2321822
Title
Real-time investigation of In segregation by RHEED measurements during MBE growth of InGaAs on GaAs[001]
Author
Martini, S. ; Lamas, T.E. ; Quivy, A.A. ; da Silva, E.C.F. ; Leite, J.R.
Author_Institution
Inst. de Fisica, Sao Paulo Univ., Brazil
fYear
2002
fDate
15-20 Sept. 2002
Firstpage
161
Lastpage
162
Abstract
Since its discovery, surface segregation in III/V semiconductor alloys has been the subject of numerous studies, in particular in InGaAs/GaAs quantum wells because of their importance to the optoelectronics and microwave industries. Therefore, new experimental data and techniques about this subject are welcome in order to identify the physical mechanisms responsible for the effect. In the present work, we propose a simple but efficient way to determine, in situ and in real time, the surface segregation of indium (In) atoms during the growth of InGaAs layers on GaAs[001] substrates. Our method, that is based on the interpretation of the intensity decay of the reflection high-energy electron diffraction (RHEED) oscillations, differs from the other few RHEED studies by the fact that those only provide qualitative results or are restricted to a specific material or growth technique.
Keywords
III-V semiconductors; gallium arsenide; indium compounds; molecular beam epitaxial growth; reflection high energy electron diffraction; semiconductor growth; semiconductor quantum wells; surface segregation; 520 C; GaAs[001]; In segregation; InGaAs; InGaAs-GaAs; MBE growth; RHEED oscillations; intensity decay; quantum wells; surface segregation; Atomic layer deposition; Electrons; Gallium arsenide; Indium gallium arsenide; Molecular beam epitaxial growth; Optical reflection; Rough surfaces; Semiconductor materials; Substrates; Surface roughness;
fLanguage
English
Publisher
ieee
Conference_Titel
Molecular Beam Epitaxy, 2002 International Conference on
Conference_Location
San Francisco, CA, USA
Print_ISBN
0-7803-7581-5
Type
conf
DOI
10.1109/MBE.2002.1037809
Filename
1037809
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