• DocumentCode
    2322594
  • Title

    Growth and characterisation of MgS/CdSe self-assembled quantum dots

  • Author

    Bradford, C. ; Urbaszek, B. ; Funato, M. ; Balocchi, A. ; Graham, T.C.M. ; McGhee, E.J. ; Warburton, R.J. ; Prior, K.A. ; Cavenett, B.

  • Author_Institution
    Dept. of Phys., Heriot-Watt Univ., Edinburgh, UK
  • fYear
    2002
  • fDate
    15-20 Sept. 2002
  • Firstpage
    257
  • Lastpage
    258
  • Abstract
    MgS has a very large bandgap of /spl sim/ 5eV and can form an excellent barrier material for wide-gap II-VI quantum structures. Although its stable crystal structure is rocksalt, our group has recently established a novel molecular beam epitaxy (MBE) technique that allows us to grow zinc-blende MgS lattice matched to GaAs substrates to thicknesses greater than 130 nm [1]. The lattice parameter of zinc-blende MgS is almost the same as that of ZnSe. Accordingly, strain between MgS and CdSe is almost identical to that between ZnSe and CdSe and a transition from 2D to 3D growth is expected with increasing CdSe coverage. Using the barrier material MgS with CdSe dots instead of ZnSe has two advantages. Firstly, large band discontinuities, which are estimated to be 2.1 and 0.9eV for the conduction and valence bands, respectively, will provide strong carrier confinement. Secondly, interdiffusion of MgS and CdSe is inhibited due to the immiscibility of these two materials. The clear material boundary between the dots and the barrier will enhance the confinement even further.
  • Keywords
    II-VI semiconductors; atomic force microscopy; binding energy; cadmium compounds; energy gap; magnesium compounds; molecular beam epitaxial growth; photoluminescence; semiconductor epitaxial layers; semiconductor growth; semiconductor quantum dots; 0.2 to 0.5 meV; 240 C; 2D/spl rarr/3D growth transition; 300 K; AFM; CdSe quantum dots; MBE technique; MgS-CdSe; MgS/CdSe quantum dots structures; MgS/CdSe self-assembled quantum dots; PL emission; atomic force microscopy; bandgap; novel molecular beam epitaxy technique; roughness measurements; stable crystal structure; wide-gap 11VI quantum structures; Carrier confinement; Conducting materials; Crystalline materials; Gallium arsenide; Lattices; Molecular beam epitaxial growth; Photonic band gap; Quantum dots; Substrates; Zinc compounds;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Molecular Beam Epitaxy, 2002 International Conference on
  • Conference_Location
    San Francisco, CA, USA
  • Print_ISBN
    0-7803-7581-5
  • Type

    conf

  • DOI
    10.1109/MBE.2002.1037857
  • Filename
    1037857