• DocumentCode
    2326829
  • Title

    Mechanical feasibility analysis of process optimized silicon microneedle for biomedical applications

  • Author

    Abser, Md Nurul ; Gaffar, Md ; Islam, Md Shofiqul

  • Author_Institution
    Dept. of Electr. & Electron. Eng., Univ. of Inf. Technol. & Sci., Dhaka, Bangladesh
  • fYear
    2010
  • fDate
    18-20 Dec. 2010
  • Firstpage
    222
  • Lastpage
    225
  • Abstract
    In our previous work, we proposed a process optimized hollow silicon (Si) microneedle structure on a silicon chip, which had the highest aspect ratio (AR) reported so far. The 150 micrometer (μm) tall optimized microneedle structure with an AR of about 30:1 was fabricated by reactive ion etch or RIE process on a p-type 500 μm thick Si substrate for drug delivery applications. In this paper we have investigated mechanical properties of the process optimized hollow Si microneedle. More specifically, bending and buckling forces, Von Mises stress, tangential shear force, and effects of skin and/or tissue penetration pressure on the optimized microneedle have been analyzed by finite element method. Three dimensional solid stress and strain curves for the optimized structure have been reported. Both analytical and simulation results show that buckling force has the greatest influence on mechanical stability and that the force with the least mechanical impact is tangential shear force. The detailed analysis indicates that the optimized structure would be compatible with modern biomedical microsystems.
  • Keywords
    bending; biomechanics; buckling; drug delivery systems; elemental semiconductors; finite element analysis; mechanical stability; silicon; sputter etching; tissue engineering; RIE processing; Si; Von Mises stress; bending; biomedical applications; buckling force; drug delivery applications; finite element method; least mechanical impact; mechanical feasibility analysis; mechanical properties; mechanical stability; modern biomedical microsystem; optimized microneedle; process optimized hollow silicon microneedle structure; reactive ion etching; silicon chip; size 500 mum; skin effects; strain curves; tangential shear force; three dimensional solid stress; tissue penetration pressure; bending force; biomedical microsystems; buckling force; finite element method; hollow Si microneedle; shear force;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electrical and Computer Engineering (ICECE), 2010 International Conference on
  • Conference_Location
    Dhaka
  • Print_ISBN
    978-1-4244-6277-3
  • Type

    conf

  • DOI
    10.1109/ICELCE.2010.5700668
  • Filename
    5700668