DocumentCode :
2327812
Title :
Low loss InP-based photonic crystal waveguides etched with Ar/Cl2 chemically assisted ion beam etching
Author :
Mulot, M. ; Anand, Sruthy ; Swillo, M. ; Qiu, M. ; Jaskorzynska, B. ; Talneau, A.
Author_Institution :
Dept. of Microelectron. & Inf. Technol., R. Inst. of Technol., Kista, Sweden
Volume :
6
fYear :
2001
fDate :
2001
Firstpage :
32
Abstract :
We demonstrate a loss of 1 dB/100 μm in photonic crystal (PC) waveguides realized in a InP-based heterostructure by Ar/Cl2 chemical assisted ion beam etching. The quality of PC etched with two different process conditions is compared by using the shape and the position of the mode-gap as an assessment tool.
Keywords :
indium compounds; integrated optoelectronics; optical planar waveguides; sputter etching; Ar; Ar/Cl2; Cl2; InP; InP-based heterostructure; chemically assisted ion beam etching; integrated optoelectronics; low loss photonic crystal waveguides; mode gap; Argon; Chemicals; Etching; Ion beams; Optical losses; Personal communication networks; Photonic crystals; Photonic integrated circuits; Shape; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Optical Communication, 2001. ECOC '01. 27th European Conference on
Print_ISBN :
0-7803-6705-7
Type :
conf
DOI :
10.1109/ECOC.2001.989035
Filename :
989035
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2327812
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