DocumentCode :
2329530
Title :
Yield Prediction Method Considering The Limit Of Sub-Micron Pattern Fabrication
Author :
Hattori, N. ; Ikeno, M. ; Nagata, H.
Author_Institution :
ULSI Laboratory, Mitsubishi Electric Corporation
fYear :
1994
fDate :
21-22 June 1994
Firstpage :
151
Lastpage :
154
Abstract :
Many random defects are caused by deposited particles during the manufacturing processes. Therefore, defect density and yield have been predicted from the information of particle characterization and the feature analysis of designed patterns to take effective measures for yield enhancement. The report gives the procedure of this prediction and discusses the parameters for the use in the critical fabrication size. Our parametric improvement provides an accurate prediction.
Keywords :
Circuits; Cleaning; Density measurement; Fabrication; Information analysis; Laboratories; Manufacturing processes; Pattern analysis; Prediction methods; Yield estimation;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Manufacturing, 1994. Extended Abstracts of ISSM '94. 1994 International Symposium on
Conference_Location :
Tokyo, Japan
Type :
conf
DOI :
10.1109/ISSM.1994.729443
Filename :
729443
Link To Document :
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