Title :
Yield Prediction Method Considering The Limit Of Sub-Micron Pattern Fabrication
Author :
Hattori, N. ; Ikeno, M. ; Nagata, H.
Author_Institution :
ULSI Laboratory, Mitsubishi Electric Corporation
Abstract :
Many random defects are caused by deposited particles during the manufacturing processes. Therefore, defect density and yield have been predicted from the information of particle characterization and the feature analysis of designed patterns to take effective measures for yield enhancement. The report gives the procedure of this prediction and discusses the parameters for the use in the critical fabrication size. Our parametric improvement provides an accurate prediction.
Keywords :
Circuits; Cleaning; Density measurement; Fabrication; Information analysis; Laboratories; Manufacturing processes; Pattern analysis; Prediction methods; Yield estimation;
Conference_Titel :
Semiconductor Manufacturing, 1994. Extended Abstracts of ISSM '94. 1994 International Symposium on
Conference_Location :
Tokyo, Japan
DOI :
10.1109/ISSM.1994.729443