DocumentCode
2329665
Title
Yield Enhancement Of An Advanced Poly-Emitter Complementary Bipolar Technology
Author
Lopez-Serrano, J. ; Song W.Koh ; Crandell, T.L. ; Delgado, J.A. ; Nicolay, H.C. ; Haycock, T.L. ; Strojwas, A.J.
Author_Institution
Carnegie Mellon University
fYear
1994
fDate
21-22 June 1994
Firstpage
183
Lastpage
186
Abstract
This paper presents a methodology for the enhancement of VLSI process manufacturability with TCAD tools. Once the fabrication equipment fluctuations are characterized, Monte Carlo simulations and sensitivity analyses are used to design corrective actions that minimize process variability, thus improving the manufacturability. This approach was successfully implemented in an advanced bipolar technology at Harris, resulting in a 15% improvement in yield.
Keywords
Electrical resistance measurement; Etching; Fluctuations; Fluid flow; Furnaces; Integrated circuit yield; Manufacturing processes; Pulp manufacturing; Semiconductor device manufacture; Sensitivity analysis;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Manufacturing, 1994. Extended Abstracts of ISSM '94. 1994 International Symposium on
Conference_Location
Tokyo, Japan
Type
conf
DOI
10.1109/ISSM.1994.729450
Filename
729450
Link To Document