• DocumentCode
    2329949
  • Title

    Challenges and prospects of RF oscillators using silicon resonant tunneling diodes

  • Author

    Buccafurri, E. ; Medjahdi, A. ; Calmon, F. ; Clerc, R. ; Pala, M. ; Poncet, A. ; Ghibaudo, G.

  • Author_Institution
    INL-INSA-Lyon, Villeurbanne, France
  • fYear
    2009
  • fDate
    14-18 Sept. 2009
  • Firstpage
    220
  • Lastpage
    223
  • Abstract
    Advanced SOI and strained-SOI (s-SOI) technologies may be an alternative option to integrate resonant tunneling diodes (RTD) in a silicon process. To investigate the expected performances of such technologies, a complete DC and AC compact model of silicon RTD has been proposed, and implemented in a circuit simulator. RTD based RF oscillators have been simulated and compared to more conventional silicon circuits. Even if SOI based RTD offers lower performances than their III-V counterparts, it turns out that extremely low power RF oscillator at 20 GHz can be realized on silicon using this technology.
  • Keywords
    radiofrequency oscillators; resonant tunnelling diodes; silicon-on-insulator; III-V counterparts; RF oscillators; advanced SOI technology; circuit simulator; frequency 20 GHz; silicon resonant tunneling diodes; silicon-on-insulator; strained SOI technology; Analytical models; Circuit simulation; Diodes; Oscillators; Quantum capacitance; Quantum computing; Radio frequency; Resonance; Resonant tunneling devices; Silicon on insulator technology;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    ESSCIRC, 2009. ESSCIRC '09. Proceedings of
  • Conference_Location
    Athens
  • ISSN
    1930-8833
  • Print_ISBN
    978-1-4244-4354-3
  • Type

    conf

  • DOI
    10.1109/ESSCIRC.2009.5325989
  • Filename
    5325989