DocumentCode
2329949
Title
Challenges and prospects of RF oscillators using silicon resonant tunneling diodes
Author
Buccafurri, E. ; Medjahdi, A. ; Calmon, F. ; Clerc, R. ; Pala, M. ; Poncet, A. ; Ghibaudo, G.
Author_Institution
INL-INSA-Lyon, Villeurbanne, France
fYear
2009
fDate
14-18 Sept. 2009
Firstpage
220
Lastpage
223
Abstract
Advanced SOI and strained-SOI (s-SOI) technologies may be an alternative option to integrate resonant tunneling diodes (RTD) in a silicon process. To investigate the expected performances of such technologies, a complete DC and AC compact model of silicon RTD has been proposed, and implemented in a circuit simulator. RTD based RF oscillators have been simulated and compared to more conventional silicon circuits. Even if SOI based RTD offers lower performances than their III-V counterparts, it turns out that extremely low power RF oscillator at 20 GHz can be realized on silicon using this technology.
Keywords
radiofrequency oscillators; resonant tunnelling diodes; silicon-on-insulator; III-V counterparts; RF oscillators; advanced SOI technology; circuit simulator; frequency 20 GHz; silicon resonant tunneling diodes; silicon-on-insulator; strained SOI technology; Analytical models; Circuit simulation; Diodes; Oscillators; Quantum capacitance; Quantum computing; Radio frequency; Resonance; Resonant tunneling devices; Silicon on insulator technology;
fLanguage
English
Publisher
ieee
Conference_Titel
ESSCIRC, 2009. ESSCIRC '09. Proceedings of
Conference_Location
Athens
ISSN
1930-8833
Print_ISBN
978-1-4244-4354-3
Type
conf
DOI
10.1109/ESSCIRC.2009.5325989
Filename
5325989
Link To Document