Title :
MOSFET Modeling for 45nm and Beyond
Author :
Cao, Yu ; McAndrew, Colin
Author_Institution :
ASU, Tempe
Abstract :
Compact MOSFET models are a critical link between technology and design. The inexorable reduction in supply voltage and geometry to 45 nm and below adds or emphasizes physical effects not important in the past, and so continues to expand the requirements for MOSFET models. At and below 45 nm, process variations, reliability, proximity effects, high-k gate materials, and non-classical device structures all challenge modeling. This tutorial presents fundamentals and evolution of compact MOSFET models, and techniques to address the new challenges.
Keywords :
MOSFET; integrated circuit design; MOSFET models; high-k gate materials; proximity effects; CMOS technology; Circuit simulation; Integrated circuit modeling; MOSFET circuits; Materials reliability; Physics; Semiconductor device modeling; Semiconductor materials; Solid modeling; Threshold voltage;
Conference_Titel :
Computer-Aided Design, 2007. ICCAD 2007. IEEE/ACM International Conference on
Conference_Location :
San Jose, CA
Print_ISBN :
978-1-4244-1381-2
Electronic_ISBN :
1092-3152
DOI :
10.1109/ICCAD.2007.4397337