Title :
Measurement of accelerated plasma in plasma focus by laser differential interferometry methods
Author :
Huang, S.J. ; Wang, X.X. ; Yang, T.C.
Author_Institution :
Dept. of Electr. Eng., Tsinghua Univ., Beijing, China
Abstract :
Summary Form only given, as follows. The run-down phase of the discharge in a plasma focus device was studied by means of differential interferometry. The dynamics and the structure of the plasma sheath were measured with an interferograph under different hydrogen gas pressures. The relation between X-ray yield and the sheath structure was studied. The experimental results show that in the rundown phase of the discharge there is a clear plasma sheath. The thickness of sheath increases with filling gas pressure (15.5 approximately 5 torr). When the pressure reaches 5.0 torr the sheath back cannot be distinguished clearly. The X-ray yield decreases as the thickness of the plasma sheath increases. The yield is very small when there is a disturbance behind the sheath front. Between 1.5 and 5.0 torr filling pressure, the velocity of the sheath is about 5.5*10/sup 6/ cm/s.<>
Keywords :
X-ray emission spectra; light interferometry; plasma diagnostics; plasma focus; plasma sheaths; 5 to 15.5 torr; H/sub 2/; X-ray yield; accelerated plasma; laser differential interferometry methods; plasma focus; plasma sheath; run-down phase; sheath structure; sheath thickness; sheath velocity; Optical interferometry; Plasma focus; Plasma measurements; Plasma sheaths;
Conference_Titel :
Plasma Science, 1989. IEEE Conference Record - Abstracts., 1989 IEEE International Conference on
Conference_Location :
Buffalo, NY, USA
DOI :
10.1109/PLASMA.1989.166136