DocumentCode :
2332750
Title :
Electrical property of DNA field-effect transistor; Charge retention property
Author :
Maeno, S. ; Takagi, Shinichi ; Matsuo, Naoto ; Yamana, Kazushige ; Heya, Akira ; Takada, Tatsuo ; Yokoyama, Shiyoshi
Author_Institution :
Dept. of Mater. Sci. & Chem., Univ. of Hyogo, Himeji, Japan
fYear :
2012
fDate :
9-11 May 2012
Firstpage :
1
Lastpage :
2
Abstract :
We discovered the charge retention property of the field-effect transistor (FET) in a Si gate/SiO2/DNA channel structure. The DNA FET with the Si source and drain showed hole conduction, and the drain current was controlled by the gate voltage application. By inserting the refresh process of gate voltage application of -50V between each measurement, the current increase was restrained. This phenomenon indicates that the trap and detrap process of electrons occurs in the DNA channel depending on the gate voltage application. The charge retention mechanism was also discussed.
Keywords :
DNA; electrons; elemental semiconductors; field effect transistors; silicon; silicon compounds; DNA FET; DNA channel structure; DNA field-effect transistor; Si-SiO2; charge retention property; drain current; electrical property; electron detrap processing; electron trap processing; gate voltage application; hole conduction; refresh process insertion; voltage -50 V; Current measurement; DNA; Electrodes; FETs; Logic gates; Silicon; Voltage measurement; DNA; FET; charge retention; space change limited surrents;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Future of Electron Devices, Kansai (IMFEDK), 2012 IEEE International Meeting for
Conference_Location :
Osaka
Print_ISBN :
978-1-4673-0837-3
Type :
conf
DOI :
10.1109/IMFEDK.2012.6218621
Filename :
6218621
Link To Document :
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