• DocumentCode
    2333740
  • Title

    A comparative study of dynamic characteristics on 16-nm-gate planar CMOS and bulk FinFETs´ differential amplifier

  • Author

    Cheng, Hui-Wen ; Li, Yiming

  • Author_Institution
    Inst. of Commun. Eng., Nat. Chiao Tung Univ., Hsinchu, Taiwan
  • fYear
    2010
  • fDate
    1-3 Dec. 2010
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    The performance comparison of differential amplifier between 16-nm planar CMOS and FinFET with different AR are conducted. The results of this study show that the FinFET exhibits excellent DC characteristic than other structures. The differential amplifier with a higher gain was also obtained using FinFET. We are currently studying the effect of device variability on dynamic characteristics of differential amplifier.
  • Keywords
    CMOS analogue integrated circuits; MOSFET; differential amplifiers; DC characteristic; bulk FinFET differential amplifier; device variability effect; gate planar CMOS differential amplifier; size 16 nm;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Enabling Science and Nanotechnology (ESciNano), 2010 International Conference on
  • Conference_Location
    Kuala Lumpur
  • Print_ISBN
    978-1-4244-8853-7
  • Type

    conf

  • DOI
    10.1109/ESCINANO.2010.5701053
  • Filename
    5701053