Nanosensors for ubiquitous network

In this paper MIMOS and the R&D work on the nanomaterials for sensing elements and of material functionalization will be pursued towards application of sensors. The facility for nanomaterial growth is already available together with other equipments for material characterization such as atomic force microscopy (AFM), scanning electron microscopy (SEM) and transmission electron microscopy (TEM) to determine surface morphology, grain size and structure; small angle X-ray scattering (SAXS) for particle size distribution; and Raman spectroscopy to characterize the stress in materials and chemical binding. In this presentation, some of the work in the realization of nanosensor materials and their characterization will be disclosed.The availability of a 0.35μm wafer fabrication facility in MIMOS also allows us to fabricate nanostructures using standard semiconductor technology for application in nano-electromechanical sensors. In MIMOS, we are able to fabricate polysilicon, silicon dioxide, silicon nitride and tungsten nanostructures with dimensions down to 10 nm on an 8" silicon wafer by spacer technology.