DocumentCode :
2335559
Title :
Soft X-ray emissions by high current vacuum discharges
Author :
Arita, H. ; Suzuki, Kenji ; Kurosawa, Yoshiaki ; Hirasawa, K.
Author_Institution :
Hitachi Ltd., Tokyo, Japan
fYear :
1989
fDate :
0-0 1989
Firstpage :
113
Abstract :
Summary Form only given, as follows. The authors have investigated the vacuum spark, which is utilized in the spectroscopic study of highly charged ions. One merit of the vacuum spark is its ability to produce a stable spot plasma between the electrodes. Another is its flexibility in selection of characteristic X-ray emission wavelengths, because many metals can be used for this purpose. To make a stable spot plasma, it is important to select the proper arrangement and shape of the electrodes. The authors have examined relationships between electrode shape and X-ray intensity, electrode material and X-ray intensity, electrode shape and X-ray emission sites and soft X-ray wavelengths for various electrodes. Mainly aluminum, molybdenum, and copper electrodes were utilized. X-rays were emitted when a pulse current of about 150 kA flowed and increased as the current flow became larger. A high X-ray intensity was obtained when using a spherical anode and conical cathode and a stable spot plasma was produced. In the case of molybdenum the 0.52-nm line and the 0.65-1.2-nm continuum were confirmed. In the case of the aluminum alloy, which contained magnesium, the 0.62-, 0.66-, 0.78-, and 0.92-nm lines were confirmed.<>
Keywords :
discharges (electric); plasma diagnostics; sparks; 0.52 nm; 0.62 nm; 0.65 to 1.2 nm; 0.66 nm; 0.78 nm; 0.92 nm; 150 kA; Al; Cu; Mo; X-ray emission wavelengths; X-ray emissions; X-ray intensity; conical cathode; continuum; current flow; electrodes; high current vacuum discharges; highly charged ions; pulse current; soft X-ray; spectroscopic study; spherical anode; stable spot plasma; vacuum spark; Gas discharges; Plasma measurements; Sparks;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1989. IEEE Conference Record - Abstracts., 1989 IEEE International Conference on
Conference_Location :
Buffalo, NY, USA
Type :
conf
DOI :
10.1109/PLASMA.1989.166163
Filename :
166163
Link To Document :
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